The physics and phenomenology of One Atmosphere Uniform Glow Discharge Plasma (OAUGDP™) reactors for surface treatment applications
The physics and phenomenology of One Atmosphere Uniform Glow Discharge Plasma (OAUGDP™) reactors for surface treatment applications
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DOI：
10.1088/0022-3727/38/4/007
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发表时间：
2005-02
期刊：
影响因子：
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通讯作者：
J. Reece Roth;J. Ráheľ;Xin Dai;D. M. Sherman
中科院分区：
文献类型：
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作者：
J. Reece Roth;J. Ráheľ;Xin Dai;D. M. Sherman
在本文中，我们提供了基于单大气均匀辉光放电等离子体(OAUGDP™)的等离子体反应器的物理和现象学数据，这些数据有助于优化等离子体形成、均匀和表面处理的条件。结果表明，提供给反应堆的实际功率(而不是无功功率)被分配给绝缘材料的介质加热和提供给等离子体的可用于电离和活性物种产生的功率。给出了介质加热功率输入与OAUGDP™放电工作频率和电压的关系。
In this paper, we present data on the physics and phenomenology of plasma reactors based on the One Atmosphere Uniform Glow Discharge Plasma (OAUGDP™) that are useful in optimizing the conditions for plasma formation, uniformity and surface treatment applications. It is shown that the real (as opposed to reactive) power delivered to a reactor is divided between dielectric heating of the insulating material and power delivered to the plasma available for ionization and active species production. A relationship is given for the dielectric heating power input as a function of the frequency and voltage at which the OAUGDP™ discharge is operated.