Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors
Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors
复制标题
基于啁啾Mo/Si多层镜的极紫外反射式相位延迟器设计
DOI：
10.1107/s1600577521006913
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发表时间：
2021
期刊：
影响因子：
--
通讯作者：
Lin Chengyou
中科院分区：
文献类型：
--
作者：
Yang Song;Chen Shujing;Lin Chengyou
极紫外相位延迟器是极紫外同步辐射偏振分析和转换的重要光学元件。本文利用线性啁啾Mo/Si多层膜反射镜设计了一种极紫外相位延迟器。随着啁啾多层膜厚度的增加，s-和p-偏振光之间的反射相位延迟先增加，然后达到最大值。对于中心厚度为14.7 nm的线性啁啾Mo/Si多层膜，当双层膜数从2增加到20时，对于光子能量为90 eV的EUV光源，最大相位延迟从5.97°增加到245.10°。 此外，还研究和比较了不同光子能量（80 eV，85 eV和90 eV）下啁啾镜的相位延迟。 通过对啁啾镜内部光强分布的研究，分析了反射相位延迟改善的物理机制。
The extreme ultraviolet (EUV) phase retarder is an important optical element for polarization analysis and conversion of EUV synchrotron radiation. In this paper, a linearly chirped Mo/Si multilayer mirror is used to design an EUV phase retarder. With increasing thickness variation of the chirped multilayer, the reflective phase retardation between s- and p-polarized light increases at first and then reaches its maximum value. When the bilayer number increases from 2 to 20, the maximum phase retardation for an EUV source with a photon energy of 90 eV increases from 5.97° to 245.10° for a linearly chirped Mo/Si multilayer with 14.7 nm central thickness. In addition, the phase retardations of chirped mirrors at different photon energies (80 eV, 85 eV and 90 eV) are also investigated and compared. Furthermore, the physical mechanism of reflective phase retardation improvement is also studied by investigating the field intensity distributions inside chirped mirrors.