Embedded Microstructure Fabrication Using Developer-Permeability of Semi-Cross-Linked Negative Resist
Embedded Microstructure Fabrication Using Developer-Permeability of Semi-Cross-Linked Negative Resist
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DOI：
10.1109/jmems.2010.2067202
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发表时间：
2010-10-01
影响因子：
2.7
通讯作者：
Tabata, Osamu
中科院分区：
文献类型：
--
作者：
Hirai, Yoshikazu;Sugano, Koji;Tabata, Osamu
报道了一种新颖、简单的单层负性光刻胶微结构三维制作技术。所提出的技术允许一个嵌入式微结构的制造与一个单一的曝光和随后的发展过程。所提出的制造技术的独特之处在于开发方法，该方法能够快速制造具有相对较大面积但具有微米尺寸特征的基于聚合物的微流体系统。例如，宽度为100 μ m，长度为50 mm的微通道的特征，足以用于微流体系统，用相对短的（< 20 min）开发时间成功地制造。这些特征是通过顶膜对显影剂的有趣的物理响应来实现的;显影剂渗透通过由半交联的光致抗蚀剂制成的顶膜区域，并且渗透的显影剂同时溶解未交联的光致抗蚀剂。作为一个步骤，对实际使用的建议的发展方法，工艺参数集（曝光剂量，后曝光烘烤（PEB）的时间，和温度）相关的顶部膜区域的交联反应进行了研究，通过采用交联反应模型描述的化学反应过程中的UV曝光和PEB。通过一系列的实验，1）获得了厘米级嵌入式微通道的工艺参数设置标准; 2）成功地证明了该方法在聚合物微流控系统中的适用性。
This paper reports on a novel and simple 3-D fabrication technique of microstructures embedded in a single-layer negative resist. The proposed technique allows one the fabrication of an embedded microstructure with a single exposure and the subsequent development process. The unique feature of the proposed fabrication technique is the development method which enables the rapid fabrication of polymer-based microfluidic systems with relatively large areas but with micrometer-sized features. For example, features of microchannels, on the order of 100 mu m in width and 50 mm in length, sufficient for microfluidic systems, were successfully fabricated with a relatively short (< 20 min) development time. These features are realized by the interesting physical response of the top-membrane to the developer; the developer permeates through the top-membrane region made of semi-cross-linked photoresist, and the permeated developer dissolves the uncross-linked photoresist at the same time. As a step toward the practical use of the proposed development method, process parameter sets (exposure dose, postexposure bake (PEB) time, and temperature) related to the cross-linking reaction of the top-membrane region were investigated by employing the cross-linking reaction model describing the chemical reaction during the UV exposure and the PEB. Through a series of experiments, 1) a criterion of process parameter sets for the fabrication of centimeter-long embedded microchannels was obtained, and 2) the applicability to polymer-based microfluidic systems was successfully demonstrated.