Collagen Production in Diabetic Wounded Fibroblasts in Response to Low-Intensity Laser Irradiation at 660 nm
Collagen Production in Diabetic Wounded Fibroblasts in Response to Low-Intensity Laser Irradiation at 660 nm
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DOI：
10.1089/dia.2012.0125
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发表时间：
2012-12-01
影响因子：
5.4
通讯作者：
Abrahamse, Heidi
中科院分区：
文献类型：
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作者：
Ayuk, Sandra M.;Houreld, Nicolette N.;Abrahamse, Heidi
背景：I型胶原（Col-I）是细胞外基质的主要成分，在伤口愈合过程中起重要作用。一些研究表明，低强度激光照射（LILI）生物刺激Col-I合成在体外和体内。本研究旨在确定LILI是否影响胶原蛋白的产生和相关的细胞反应在体外糖尿病损伤成纤维细胞model.Materials和方法：本研究进行分离的人皮肤成纤维细胞。使用不同的细胞模型（正常和糖尿病损伤）。以5 J/cm（2）的能量在660 nm波长下照射细胞，孵育48或72 h。未照射的细胞（0 J/cm（2））用作对照。细胞活力（台盼蓝排除试验），形态学（明视野显微镜）、增殖[VisionBlue（TM）快速细胞增殖测定和3-（4，5-二甲基噻唑-2-基）-2，5-二苯基溴化四唑鎓含量测定]和Col-I（酶联免疫吸附试验）进行评估。在660 nm处以5 J/cm（2）照射糖尿病损伤细胞显示细胞迁移、存活、增殖和胶原含量显著增加。该研究表明，LILI在660 nm处刺激体外糖尿病伤口愈合中的Col-I合成。
Background: Collagen type I (Col-I) is a major component of the extracellular matrix and is important in wound healing processes. Several studies have shown that low-intensity laser irradiation (LILI) biostimulates Col-I synthesis both in vitro and in vivo. This study aimed to determine if LILI affects collagen production and related cellular responses in an in vitro diabetic wounded fibroblast model.Materials and Methods: This study was performed on isolated human skin fibroblasts. Different cell models (normal and diabetic wounded) were used. Cells were irradiated with 5 J/cm(2) at a wavelength of 660 nm and incubated for 48 or 72 h. Nonirradiated cells (0 J/cm(2)) were used as controls. Cellular viability (Trypan blue exclusion test), morphology (bright-field microscopy), proliferation [VisionBlue (TM) quick cell proliferation assay and 3-(4,5-dimethylthiazol-2-yl)-2,5-diphenyltetrazolium bromide assay], and Col-I (enzyme-linked immunoabsorbent assay) were assessed.Results: Diabetic wounded cells irradiated with 5 J/cm(2) at 660 nm showed a significant increase in cell migration, viability, proliferation, and collagen content.Conclusions: This study shows that LILI stimulates Col-I synthesis in diabetic wound healing in vitro at 660 nm.