CO DISSOCIATION ON RH DEPOSITED ON REDUCED CERIUM OXIDE THIN FILMS
CO DISSOCIATION ON RH DEPOSITED ON REDUCED CERIUM OXIDE THIN FILMS
复制标题
DOI：
10.1006/jcat.1999.2679
复制
发表时间：
1999-12
影响因子：
7.3
通讯作者：
D. Mullins;S. Overbury
中科院分区：
文献类型：
--
作者：
D. Mullins;S. Overbury
摘要：采用软x射线光电子能谱法研究了CO在负载铑的二氧化铈上的吸附和反应。研究了该体系与氧化铈的氧化程度和Rh的不同制备方法的关系。Rh上的CO分子和C原子在c1s光谱中很容易区分。在c1s光谱中还观察到CO以碳酸盐或羧酸盐的形式直接吸附在二氧化铈上。CO对沉积在铈上的Rh的解离程度（Rh/ cex）直接取决于铈的氧化程度。如果氧化铈底物被高度还原，则可以发生几乎完全的分解。相对于Rh沉积在氧化铈上，CO分子在还原铈上的温度也更高。解离的程度不取决于Rh沉积的量或沉积后的退火处理。
Abstract The adsorption and reaction of CO on Rh-loaded ceria was studied by soft x-ray photoelectron spectroscopy. The system was studied as a function of the degree of oxidation of the ceria and different preparations of the Rh. Molecular CO and atomic C on Rh are readily distinguished in the C 1 s spectra. CO adsorbed directly on ceria, possibly as carbonate or carboxylate, is also observed in the C 1 s spectra. The degree of dissociation of CO on Rh deposited on ceria (Rh/CeO x ) is directly dependent on the degree of oxidation of the ceria. Nearly total decomposition can occur if the ceria substrate is highly reduced. Molecular CO also persists to a higher temperature on Rh deposited on reduced ceria compared with Rh on oxidized ceria. The degree of dissociation does not depend on the amount of Rh deposited or on the annealing treatment after deposition.