Fabrication of Cu nanogaps by electromigration and its application
Fabrication of Cu nanogaps by electromigration and its application
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电迁移制备Cu纳米间隙及其应用
DOI:
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发表时间:
2014
期刊:
影响因子:
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通讯作者:
and Yasuo Takahashi
中科院分区:
文献类型:
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作者:
Ryouta Yonesaka;Hayato Ochi;Yosuke Murakami;Masashi Arita;and Yasuo Takahashi