Dynamic matching system for radio-frequency plasma generation
Dynamic matching system for radio-frequency plasma generation
复制标题
用于射频等离子体生成的动态匹配系统
DOI：
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发表时间：
2018
期刊：
影响因子：
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通讯作者：
D. Perreault
中科院分区：
文献类型：
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作者：
Anas Al Bastami;A. Jurkov;P. Gould;M. Hsing;M. Schmidt;D. Perreault
由于高工作频率（例如 13.56 MHz）和高度可变的负载参数的结合，等离子体生成系统对射频功率放大器来说是一个特别具有挑战性的负载。我们引入了一种用于电感耦合等离子体 (ICP) 生成的动态匹配系统，该系统可在整个等离子体工作范围内无损地保持接近恒定的驱动点阻抗（最小反射功率）。该新系统利用电阻压缩网络（RCN）、阻抗变换级和一组专门配置的等离子体驱动线圈来实现对等离子体负载变化的快速调整。与等离子体系统的传统匹配技术相比，所提出的方法具有成本相对较低、响应速度较快的优点，并且不需要任何移动部件。我们描述了所提出系统的合适线圈几何形状，并讨论了 RCN 和匹配级的设计，包括设计选项和权衡。实施了原型系统，并通过 O2、C4F8 和 SF6 气体的低压 ICP 放电在 13.56 MHz 和高达 250 W 的整个等离子体工作范围内演示了其操作。
Plasma generation systems represent a particularly challenging load for radio-frequency power amplifiers owing to the combination of high operating frequency (e.g., 13.56 MHz) and highly variable load parameters. We introduce a dynamic matching system for Inductively Coupled Plasma (ICP) generation that losslessly maintains near-constant driving point impedance (minimal reflected power) across the entire plasma operating range. This new system utilizes a Resistance Compression Network (RCN), an impedance transformation stage, and a specially-configured set of plasma drive coils to achieve rapid adjustment to plasma load variations. As compared to conventional matching techniques for plasma systems, the proposed approach has the benefit of relatively low cost and fast response, and does not require any moving components. We describe suitable coil geometries for the proposed system, and treat the design of the RCN and matching stages, including design options and tradeoffs. A prototype system is implemented and its operation is demonstrated with low pressure ICP discharges with O2, C4F8, and SF6 gases at 13.56 MHz and over the entire plasma operating range of up to 250 W.