Schottky-type surface plasmon detector with nano-slit grating using enhanced resonant optical transmission

Schottky-type surface plasmon detector with nano-slit grating using enhanced resonant optical transmission
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DOI:
10.1063/1.4894150
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发表时间:
2014-08
影响因子:
3.2
通讯作者:
A. Takeda;T. Aihara;T. Aihara;M. Fukuhara;M. Fukuhara;Y. Ishii;M. Fukuda
A. Takeda;T. Aihara;T. Aihara;M. Fukuhara;M. Fukuhara;Y. Ishii;M. Fukuda
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
A. Takeda;T. Aihara;T. Aihara;M. Fukuhara;M. Fukuhara;Y. Ishii;M. Fukuda

文献摘要

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我们提出了一种金属纳米狭缝结构,以增强金膜和硅基板之间的 Au/Si 界面处的表面等离子体(SP)强度。通过将相位条件调整为空气/Au界面处的反相干涉和Au/Si界面处的同相干涉,增强了Au/Si界面处的SP强度。该结构采用时域有限差分法进行数值设计,并通过监测Au/Si肖特基型SP探测器的光电流得到实验证实。该设计以其两相匹配条件增强了Au/Si界面处的SP强度,应用于硅衬底上的环形金属光栅,并演示了光电流增强。
We propose a metal nano-slit structure to enhance the surface plasmon (SP) intensity at the Au/Si interface between a gold film and a silicon substrate. By tuning the phase conditions to be in anti-phase interference at the air/Au interface and in in-phase interference at the Au/Si interface, the SP intensity at the Au/Si interface was enhanced. This structure was numerically designed using the finite-difference time-domain method and was experimentally confirmed by monitoring of the photocurrent of an Au/Si Schottky-type SP detector. This design, with its two phase matching conditions that enhance the SP intensity at the Au/Si interface, was applied to a ring-type metal grating on a silicon substrate, and demonstrated the photocurrent enhancement.