Phase stability of cubic Mg0.55Zn0.45O thin film studied by continuous thermal annealing method
Phase stability of cubic Mg0.55Zn0.45O thin film studied by continuous thermal annealing method
复制标题
连续热退火法研究立方Mg0.55Zn0.45O薄膜的相稳定性
DOI：
10.1063/1.3097022
复制
发表时间：
2009-03-09
影响因子：
4
通讯作者：
Fan, X. W.
中科院分区：
文献类型：
--
作者：
Ju, Z. G.;Shan, C. X.;Fan, X. W.
通过连续热退火研究了金属有机化学气相沉积立方Mg0.55Zn0.45O薄膜的相稳定性。经过750℃连续热退火后，晶体质量和表面光洁度得到很大改善。这是由于热退火减少了间隙锌。然而，当样品在较高温度（850°C）下退火时，发生了相分离，这从 X 射线衍射图和光学透射光谱中都可以看出。
The phase stability of cubic Mg0.55Zn0.45O thin film grown by metal-organic chemical vapor deposition was studied through continuous thermal annealing. The crystal quality and surface smoothness were greatly improved after a continuous thermal annealing at 750 °C. It is attributed to the reducing of interstitial Zn by thermal annealing. However, phase segregation occurred when the sample was annealed at a higher temperature (850 °C), which is identified from both x-ray diffraction patterns and optical transmission spectra.