Phosphate application enhances the resistance of arbuscular mycorrhizae in clover plants to cadmium via polyphosphate accumulation in fungal hyphae
Phosphate application enhances the resistance of arbuscular mycorrhizae in clover plants to cadmium via polyphosphate accumulation in fungal hyphae
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DOI:
10.1016/j.envexpbot.2013.11.007
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发表时间:
2014-12
影响因子:
5.7
通讯作者:
Q. Yao;Rui-Heng Yang;Liangkun Long;Honghui Zhu
中科院分区:
文献类型:
--
作者:
Q. Yao;Rui-Heng Yang;Liangkun Long;Honghui Zhu
Both phosphorus (P) application and arbuscular mycorrhizal (AM) fungal inoculation can enhance plant resistance to Cd toxicity, however, their interaction and the underlying mechanism are still unclear. The aims of this study were to investigate the effect of P application on AM resistance to Cd and to reveal the corresponding mechanism. We designed a compartmented system to separate extraradical hyphae (EH) ofRhizophagus irregularisfrom the roots of clover (Trifolium ripenseL.). EH was applied with different levels of P and cadmium (Cd). The content and uptake of P and Cd were monitored. Polyphosphate (polyP) accumulation in EH was quantified. The localization of polyP and Cd was visualized using fluorescent staining. Results indicated that Cd greatly decreased EH biomass and polyP accumulation while P increased polyP accumulation. PolyP accumulation in EH enhanced AM resistance to Cd, and also reduced Cd uptake by plants. Fluorescent images indicated the overlapping of Cd signals and polyP signals. These data suggest that P application can enhance the resistance of AM to CdviapolyP chelation, and this represents another mechanism underlying the detoxification of Cd by AM hyphae other than the absorption by hyphae.