Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device
Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device
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DOI：
10.3807/josk.2010.14.3.266
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发表时间：
2010-09
影响因子：
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通讯作者：
Dong-Hee Lee
中科院分区：
文献类型：
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作者：
Dong-Hee Lee
在本研究中，提出了一种使用数字微镜器件（DMD）的无掩模光刻光学系统。该系统由照明光学系统、DMD和投影透镜系统组成。照明光学系统由蝇眼透镜板、405 nm窄带滤光片、聚光透镜、场透镜和250 W卤素灯组成，照明均匀性达到95%。投影透镜系统由8个光学元件组成，分辨率为4 lTEXg${\mu}m$l/TEXg。所提出的系统起到了PCB和/或FPD无掩模光刻的光学引擎的作用。此外，由于在传统光刻系统中存在掩模而引起的许多问题，例如制造掩模的费用和时间、掩模的污染、掩模的处置以及掩模的对准，可以通过所提出的系统来解决。所提出的系统进行了验证，光刻实验产生的线图案的分辨率为4 lTEXg${\mu}m$l/TEXg线宽。
In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 lTEXg${\mu}m$l/TEXg resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 lTEXg${\mu}m$l/TEXg line width.