Nucleation and growth studies of gold films prepared by evaporation and ion-assisted deposition

Nucleation and growth studies of gold films prepared by evaporation and ion-assisted deposition
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蒸发和离子辅助沉积金膜的成核和生长研究

DOI:
10.1016/0169-4332(86)90059-0
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发表时间:
1986
期刊:
影响因子:
--
通讯作者:
P. Martin
P. Martin
中科院分区:
--
文献类型:
--
作者:
R. Netterfield;P. Martin

文献摘要

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用电子束蒸发法和氧、氩离子辅助沉积法在玻璃基片上沉积了金薄膜。膜的成核和生长已监测原位椭圆偏振和光谱反射率和透射率测量。膜表面的组成已通过离子散射光谱进行了表征。这些技术表明,两种离子辅助膜的金岛发生聚结的厚度都小于沉积在清洁衬底上的蒸镀膜的厚度。监测的聚结膜在光刻蚀刻结合从两侧的涂层表面的反射率的测量表明,所有的膜有一层密度小于散装附近的空气膜界面,蒸发和氩离子辅助膜,另一个附近的金基板界面。氧离子辅助的薄膜没有表现出任何证据的界面层附近的基板,它的结论是,这些薄膜有一个更大的面积与基板的接触比蒸发或氩离子辅助的薄膜。
Thin gold films have been deposited onto glass substrates by electron-beam evaporation and by oxygen and argon ion-assisted deposition. The nucleation and growth of the films have been monitored in situ by ellipsometry and spectral reflectance and transmittance measurements. The composition of the film surface has been characterized by ion-scattering spectroscopy. These techniques show that the thickness at which coalescence of gold islands occurs is less for both ion-assisted films than for the evaporated film deposited on a clean substrate. Monitoring of coalesced films during sputter-etching combined with measurements of reflectance from both sides of the coated surface indicate that all films have a layer of density less than bulk near the air-film interface, and for evaporated and argon ion-assisted films, another near the gold-substrate interface. Oxygen ion-assisted films showed no evidence of an interfacial layer near the substrate and it is concluded that these films had a much greater area of contact with the substrate than evaporated or argon ion-assisted films.