Multilayer soft lithography of perfluoropolyether based elastomer for microfluidic device fabrication

Multilayer soft lithography of perfluoropolyether based elastomer for microfluidic device fabrication
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DOI:
10.1039/c0lc00274g
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发表时间:
2011-01-01
期刊:
影响因子:
6.1
通讯作者:
Unger, Marc Alexander
Unger, Marc Alexander
中科院分区:
工程技术1区
文献类型:
--
作者:
Devaraju, Naga Sai Gopi Krishna;Unger, Marc Alexander

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微流控装置与溶剂和其他化学品的相容性对于微反应器中的有机合成和药物筛选等许多应用非常重要。我们报道了一种新型的全氟聚醚基聚合物,利用多层软光刻(TM) (MSL)技术,用简单、直接的工艺成功地制造了微流控器件。全氟聚合物SIFEL X-71 8115是一种高度耐化学腐蚀的弹性体材料。我们演示了一个微流控装置的制造,使用非比例键合技术来键合多个SIFEL层,每个层都有光刻图案。SIFEL MSL阀的机械性能(包括驱动压力)与相同几何形状的PDMS MSL阀相似。化学相容性测试突出了SIFEL对有机溶剂,酸和碱的卓越抗性。
The compatibility of microfluidic devices with solvents and other chemicals is extremely important for many applications such as organic synthesis in microreactors and drug screening. We report the successful fabrication of microfluidic devices from a novel perfluoropolyether based polymer utilizing the Multilayer Soft Lithography (TM) (MSL) technique with simple, straightforward processing. The perfluorinated polymer SIFEL X-71 8115 is a highly chemically resistant elastomeric material. We demonstrate fabrication of a microfluidic device using an off-ratio bonding technique to bond multiple SIFEL layers, each patterned lithographically. The mechanical properties of the SIFEL MSL valves (including actuation pressures) are similar to PDMS MSL valves of the same geometry. Chemical compatibility tests highlight SIFEL's remarkable resistance to organic solvents, acids and alkalis.