Multilayer soft lithography of perfluoropolyether based elastomer for microfluidic device fabrication
Multilayer soft lithography of perfluoropolyether based elastomer for microfluidic device fabrication
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DOI:
10.1039/c0lc00274g
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发表时间:
2011-01-01
期刊:
影响因子:
6.1
通讯作者:
Unger, Marc Alexander
中科院分区:
文献类型:
--
作者:
Devaraju, Naga Sai Gopi Krishna;Unger, Marc Alexander
The compatibility of microfluidic devices with solvents and other chemicals is extremely important for many applications such as organic synthesis in microreactors and drug screening. We report the successful fabrication of microfluidic devices from a novel perfluoropolyether based polymer utilizing the Multilayer Soft Lithography (TM) (MSL) technique with simple, straightforward processing. The perfluorinated polymer SIFEL X-71 8115 is a highly chemically resistant elastomeric material. We demonstrate fabrication of a microfluidic device using an off-ratio bonding technique to bond multiple SIFEL layers, each patterned lithographically. The mechanical properties of the SIFEL MSL valves (including actuation pressures) are similar to PDMS MSL valves of the same geometry. Chemical compatibility tests highlight SIFEL's remarkable resistance to organic solvents, acids and alkalis.