Controlling the Magnetic Properties of Cr-Implanted Co/Pt
Controlling the Magnetic Properties of Cr-Implanted Co/Pt
复制标题
控制植入 Cr 的 Co/Pt 的磁性
DOI：
10.1109/tmag.2013.2279272
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发表时间：
2014
期刊：
影响因子：
--
通讯作者：
S. Iwata
中科院分区：
文献类型：
--
作者：
E. Suharyadi;T. Kato;S. Iwata
研究了离子束辐照对不同层结构的Co/Pt多层膜的微结构和磁性能的影响。采用磁控溅射法在表面氧化的Si衬底上制备了Cr/[Co/Pt]多层膜，用30 keV的Kr+离子束对该多层膜进行辐照，辐照剂量从1× 1014 ~ 5× 1015 ions/cm 2。由于Kr+离子辐照的磁性能和微结构的修改取决于Co/Pt层结构。[Co（0.4nm）/Pt（0.45nm）]15多层膜具有正方形的M-H环和垂直的易磁化轴，饱和磁化强度为620 emu/cc，矫顽力为1.1kOe。在5× 1015 ions/cm ~ 2剂量辐照后，易磁化轴由垂直于面内方向转变为面内方向。磁化率和饱和磁化强度分别下降到原来的2%和13%。俄歇电子能谱（AES）深度分布证实，Cr ~（3+）离子注入Co/Pt多层膜后，Co/Pt多层膜的矫顽力和饱和磁化强度降低，这是由于Cr ~（3+）离子注入Co/Pt多层膜后引起的。
We have investigated the modification of the microstructure and magnetic properties of Co/Pt multilayer films with various layer structures using ion beam irradiation. Cr/[Co/Pt] multilayer films prepared by a magnetron sputtering deposition on a surface oxidized Si substrate were irradiated by 30 keV Kr+ion beam with various ion doses from 1×1014to 5×1015ions/cm2. The modifications of magnetic properties and microstructures due to Kr+ion irradiation depended on Co/Pt layer structures. The as-prepared [Co(0.4 nm)/Pt(0.45 nm)]15 multilayer films were confirmed to exhibit the square shaped M-H loop and the perpendicular easy axis with a saturation magnetization of 620 emu/cc and coercivity of 1.1 kOe. After the irradiation with ion dose of 5×1015ions/cm2, the easy axis changes from perpendicular to in-plane direction. The coercivity and saturation magnetization decrease down to 2% and 13% of its original values, respectively. The decrease of coercivity and saturation magnetization is due to the implantation of the Cr atom in the top most layers into Co/Pt multilayer films caused by Kr+ion irradiation, as confirmed from Auger electron spectroscopy (AES) depth profiles.