Fabrication of antireflection structure film by roll-to-roll ultraviolet nanoimprint lithography
Fabrication of antireflection structure film by roll-to-roll ultraviolet nanoimprint lithography
复制标题
DOI：
10.1116/1.4901877
复制
发表时间：
2014-11-01
影响因子：
1.4
通讯作者：
Hiwasa, Shin
中科院分区：
文献类型：
--
作者：
Moro, Masatoshi;Taniguchi, Jun;Hiwasa, Shin
抗反射 (AR) 膜可有效防止手机和平板电脑显示屏反射光。特别是具有被称为蛾眼结构的AR结构的薄膜在防止光反射方面表现出优异的性能。在之前的一项研究中，作者报道了通过氧离子束辐照玻碳 (GC) 来制造 AR 结构。制作的图案由一系列自组装的圆锥形结构组成，并且具有低反射表面。在这项研究中，作者使用由具有 AR 结构的 GC 主模具生产的复制模具，通过卷对卷紫外纳米压印光刻将该 AR 结构转移到聚合物薄膜上。结果，作者能够以 1.8 m/min 的进给速度生产高性能 AR 薄膜。该薄膜在可见光波长下的反射率约为0.1%，透射率约为95%。 (C) 2014 年美国真空协会。
Antireflection (AR) films are useful in preventing the reflection of light from the displays of mobile phones and tablet computers. In particular, films with an AR structure known as the moth-eye structure show excellent performance in preventing light reflection. In a previous study, the authors reported the fabrication of an AR structure by oxygen ion-beam irradiation of glassy carbon (GC). The fabricated pattern consisted of a series of self-assembled conical structures and it had a low-reflection surface. In this study, the authors transferred this AR structure onto a polymer film by roll-to-roll ultraviolet nanoimprint lithography using a replica mold produced from a GC master mold with the AR structure. As a result, the authors were able to produce high-performance AR film at a feed rate of 1.8 m/min. The reflectivity of the film was about 0.1% and its transmittance was about 95% at visible wavelengths. (C) 2014 American Vacuum Society.