Chemical mechanical polishing of thin film diamond
Chemical mechanical polishing of thin film diamond
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DOI:
10.1016/j.carbon.2013.11.023
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发表时间:
2014-03-01
期刊:
影响因子:
10.9
通讯作者:
Williams, Oliver A.
中科院分区:
文献类型:
--
作者:
Thomas, Evan L. H.;Nelson, Geoffrey W.;Williams, Oliver A.
The demonstration that Nanocrystalline Diamond (NCD) can retain the superior Young's modulus (1100 GPa) of single crystal diamond twinned with its ability to be grown at low temperatures (