Nanoindentation hardness and adhesion investigations of vapor deposited nanostructured diamond films
Nanoindentation hardness and adhesion investigations of vapor deposited nanostructured diamond films
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DOI：
10.1063/1.1464233
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发表时间：
2002-04-15
影响因子：
3.2
通讯作者：
Lemons, JE
中科院分区：
文献类型：
--
作者：
Catledge, SA;Borham, J;Lemons, JE
研究了改变N-2/CH4原料气比例对Ti-6Al-4V合金基体上生长的微波等离子体化学气相沉积金刚石薄膜的结构和力学性能的影响。 CH4 和 N-2 的相对浓度（H-2 平衡）对薄膜结构、硬度和附着力有强烈影响。对于高 CH4 浓度（体积比 15%），可以获得粗糙度为 15-30 nm、良好附着力和 90 GPa 的高硬度值的纳米结构金刚石膜。我们发现沉积膜的纳米压痕硬度与等离子体中的N-2/CH4比率之间存在明显的相关性，并且硬度与拉曼峰强度的比率（1332和1555cm(-1)）之间也存在明显的相关性。使用声发射技术对纳米结构金刚石薄膜进行的划痕附着力测试显示，在 33 N 的临界力下会发生分层。这些结果表明，纳米结构金刚石薄膜可以在硬度范围为 10 GPa（中硬）至 100 GPa（超硬）的金属表面上定制，并且可以考虑用于耐磨应用，例如关节式医疗植入设备的设计。 (C) 2002 年美国物理研究所。
The effect of changing the N-2/CH4 feedgas ratio on the structure and mechanical properties of microwave plasma chemical vapor deposited diamond films grown on Ti-6Al-4V alloy substrates was investigated. The relative concentration of CH4 and N-2 (in a balance of H-2) was shown to strongly influence film structure, hardness, and adhesion. For high CH4 concentration (15% by volume), nanostructured diamond films with roughness magnitudes of 15-30 nm, good adhesion and a high hardness value of 90 GPa was obtained. A distinct correlation was found between the nanoindentation hardness of the deposited film and the N-2/CH4 ratio in the plasma, as well as a correlation of hardness to the ratio of the Raman peak intensities (1332 and 1555 cm(-1)). Scratch adhesion testing of nanostructured diamond films showed delamination at a critical force of 33 N using acoustic emission techniques. These results demonstrate that nanostructured diamond films can be tailored on metallic surfaces with hardness ranging from 10 GPa (medium-hard) to 100 GPa (superhard) and may be considered for wear resistant applications such as in the design of articulating medical implant devices. (C) 2002 American Institute of Physics.