Unexpected trends in halogen-bond based noncovalent adducts
Unexpected trends in halogen-bond based noncovalent adducts
复制标题
DOI：
10.1039/c2cc33304j
复制
发表时间：
2012-01-01
影响因子：
4.9
通讯作者：
Infante, Ivan
中科院分区：
文献类型：
--
作者：
Huber, Stefan M.;Jimenez-Izal, Elisa;Infante, Ivan
CY 3 I（Y = F、Cl、Br、I）与两种典型的刘易斯碱（氯化物和三甲胺）的卤素键基加合物的强度的意外趋势表明，化合物R-X的卤素键供体强度（刘易斯酸性）不一定随着（碳基）基团R的电负性的提高而增加。
Unexpected trends in the strengths of halogen-bond based adducts of CY3I (Y = F, Cl, Br, I) with two typical Lewis bases (chloride and trimethylamine) show that the halogen-bond donor strength (Lewis acidity) of a compound R-X is not necessarily increased with higher electronegativity of the (carbon-based) group R.