Characteristics of TiN/W2N multilayers prepared using magnetron sputter deposition with dc and pulsed dc powers
Characteristics of TiN/W2N multilayers prepared using magnetron sputter deposition with dc and pulsed dc powers
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DOI：
10.1016/j.surfcoat.2016.03.086
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发表时间：
2016-10-15
影响因子：
5.4
通讯作者：
Wu, Wan -Yu
中科院分区：
文献类型：
--
作者：
Chang, Chi-Lung;Chiou, Tz-Heng;Wu, Wan -Yu
采用直流磁控溅射（dcMS）沉积法和脉冲dcMS沉积法分别在Ar和N-2混合气体中沉积TiN和W2N涂层。首先获得单层TiN和W2N，确定多层TiN和W2N的沉积条件。制备了TiN/W2N多层膜，考察了基体转速和N-2/Ar浓度对TiN/W2N多层膜显微组织、硬度和耐蚀性能的影响。观察到多层TiN/W2N在衬底上粘附良好。此外，多层涂层的硬度和抗腐蚀性能也优于单层涂层。(C) 2016 Elsevier B.V.版权所有
A dc magnetron sputter (dcMS) deposition and a pulsed dcMS deposition methods were used respectively to deposit TiN and W2N coatings in a mixture gas of Ar and N-2. Single layer TiN and W2N were first obtained to determine the deposition condition for the multilayers. TiN/W2N multilayers were deposited and the effects of the substrate rotation speed and the N-2/Ar concentration on microstructure, hardness, and the corrosion property have been examined. It was observed that the multilayer TiN/W2N adheres well onto the substrate. In addition, the hardness and the anti-corrosion property of the multilayer are also better than that of the single-layer coatings. (C) 2016 Elsevier B.V. All rights reserved.