Raman spectroscopy study of DLC films prepared by RF plasma and filtered cathodic arc
Raman spectroscopy study of DLC films prepared by RF plasma and filtered cathodic arc
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DOI:
10.1016/j.surfcoat.2006.09.048
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发表时间:
2007-04
影响因子:
5.4
通讯作者:
P. Ha;D. Mckenzie;M. Bilek;S.C.H. Kwok;P. Chu;B. Tay
中科院分区:
文献类型:
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作者:
P. Ha;D. Mckenzie;M. Bilek;S.C.H. Kwok;P. Chu;B. Tay
The build-up of intrinsic stress in carbon thin films deposited by vapour deposition can be a major cause of delamination. Arguably, this issue has been one of the main reasons why the industrial exploitation of carbon vapour deposited films has so far been of limited success. In the present study we deposited single and multilayer thin films of carbon and found that under certain deposition conditions, we were able to produce thin films free from delamination. Single and multilayer of films Diamond-like Carbon (DLC) were prepared by Plasma Immersion Ion Implantation and Deposition (PIIID) from two deposition systems: (1) Radio-Frequency (RF) plasma and (2) Filtered Cathodic Vacuum Arc (FCVA). Raman spectroscopy revealed a shift in the peaks previously identified as D and G band in the structures. The sp2and sp3ratio contents were characterized by Raman spectroscopy.