Micropatterning of ferroelectric Bi4Ti3O12 using electron-beam-induced reaction of metal octylate films
Micropatterning of ferroelectric Bi4Ti3O12 using electron-beam-induced reaction of metal octylate films
复制标题
利用金属辛酸盐薄膜的电子束诱导反应对铁电 Bi4Ti3O12 进行微图案化
DOI:
10.1143/jjap.35.6579
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发表时间:
1996
影响因子:
1.5
通讯作者:
K. Mori
中科院分区:
文献类型:
--
作者:
S. Okamura;Y. Yagi;S. Ando;T. Tsukamoto;K. Mori
Micropatterning of ferroelectric Bi 4 Ti 3 O 12 was carried out using an electron-beam-induced reaction of metal octylate films. Bismuth and titanium octylates were used as starting materials. Precursor solutions were prepared by mixing the octylates at a Bi : Ti molar ratio of 5.2 : 3.0 and diluting with acetone. The metal octylates exhibited negative exposure characteristics upon electron beam irradiation: a sensitivity of 1.5 x 10 -4 C/cm 2 and a gamma value of 2. Precursor micropatterns were formed by electron beam irradiation on the spin-coated octylate films and successive development with toluene. The precursor micropatterns were calcined at 450°C for 10 min and sintered at 800°C for 30 min in air. A 65 x 80 μm 2 precursor micropattern was crystallized into the single-phase of Bi 4 Ti 3 O 12 by the heat treatment. Crystallized square micropatterns l μm in size consisted of small platelike crystals.