Fabrication of High-Resolution Periodical Structure in Photoresist Polymers Using Laser Interference Technique
Fabrication of High-Resolution Periodical Structure in Photoresist Polymers Using Laser Interference Technique
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DOI：
10.1143/jjap.43.2370
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发表时间：
2004-04
影响因子：
1.5
通讯作者：
S. Shibata;Y. Che;O. Sugihara;N. Okamoto;T. Kaino
中科院分区：
文献类型：
--
作者：
S. Shibata;Y. Che;O. Sugihara;N. Okamoto;T. Kaino
制备了纳米量级的周期性结构，这种结构比其他地方报道的结构更清晰、更具优势。采用双光束干涉技术，利用单脉冲Nd：YAG355 nm激光，在正型光刻胶薄膜上制备了这些结构。形成了深度大于300 nm、周期为400 nm的栅状结构，并伴随着湿显影。此外，还成功地制作出了接近理论极限的200 nm周期光栅，并获得了较高的纵横比。
Periodical structures in the nanometer order, which are clearer and of superior aspect than those reported elsewhere, were fabricated. These structures were fabricated onto a positive-type photoresist film by a two-beam interference technique using a single-pulse Nd:YAG (355 nm) laser. A grating structure with a depth of more than 300 nm and period of 400 nm was formed, accompanied by wet development. Moreover, a 200-nm-period grating, which is close to the theoretical limit, was successfully fabricated with higher aspect.