Fabrication of Optically Active Er3+-Doped Bi2O3–SiO2 Glass Thin Films by Pulsed Laser Deposition
Fabrication of Optically Active Er3+-Doped Bi2O3–SiO2 Glass Thin Films by Pulsed Laser Deposition
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DOI：
10.1143/jjap.45.5933
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发表时间：
2006-07
影响因子：
1.5
通讯作者：
S. Akiba;M. Takakura;A. Matsuda;W. Hara;Takashi Okada;Takahiro Watanabe;Y. Kondo;S. Ito;P. Ahmet;T. Chikyo;S. Tanabe;T. Hanada;M. Yoshimoto
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文献类型：
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作者：
S. Akiba;M. Takakura;A. Matsuda;W. Hara;Takashi Okada;Takahiro Watanabe;Y. Kondo;S. Ito;P. Ahmet;T. Chikyo;S. Tanabe;T. Hanada;M. Yoshimoto
我们研究了使用标称成分（mol%）为 41Bi2O3·57SiO2·2Er2O3 的玻璃靶材通过脉冲激光沉积制备的光学活性 Er3+ 掺杂 Bi2O3-SiO2 玻璃薄膜的制造条件。透明玻璃膜是在200℃、5×10-2Torr O2 下获得的。发现玻璃膜的组成和折射率与用作靶的块状玻璃接近。这些薄膜在 1.5–1.6 µm 范围内广泛发射 Er3+ 离子，并在 500–700 nm 范围内发射 Er3+ 上转换泵浦荧光。
We examined the fabrication conditions of optically active Er3+-doped Bi2O3–SiO2 glass thin films prepared by pulsed laser deposition using a glass target with a nominal composition (mol %) of 41Bi2O3·57SiO2·2Er2O3. The transparent glass films were obtained at 200 °C under 5 ×10-2 Torr O2. The glass films were found to possess a composition and a refractive index close to those of the bulk glass used as the target. The films exhibited a broad emission of Er3+ ions at around 1.5–1.6 µm as well as Er3+ upconversion-pumped fluorescence in the 500–700 nm range.