Electron temperature and plasma density of capacitive rf‐discharges in noble gases
Electron temperature and plasma density of capacitive rf‐discharges in noble gases
复制标题
稀有气体中电容性射频放电的电子温度和等离子体密度
DOI：
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发表时间：
1992
期刊：
影响因子：
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通讯作者：
K. Wüst
中科院分区：
文献类型：
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作者：
K. Wüst
研究了在中等压力下（中性原子密度从1021到1023 m−3），由27.12 MHz的射频电场维持的He，Ne，Ar和Kr中的放电。电子温度和等离子体密度测量与朗缪尔探针在8，13，和20 W的总放电功率。发现等离子体密度随输入功率的增加而增加，而电子温度仅微弱地依赖于输入功率。
Electrical discharges in He, Ne, Ar, and Kr at medium pressure (density of neutral atoms from 1021 to 1023 m−3), sustained by an rf electric field of 27.12 MHz, are investigated. Electron temperature and plasma density were measured with a Langmuir probe at 8, 13, and 20 W total discharge power. The plasma density was found to increase with the input power, whereas the electron temperature depends only weakly on the input power.