Studies on Reaction Mechanisms of EB Resist by Pulse Radiolysis
Studies on Reaction Mechanisms of EB Resist by Pulse Radiolysis
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脉冲辐解EB抗蚀剂反应机理研究
DOI：
10.2494/photopolymer.13.733
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发表时间：
2000
影响因子：
0.8
通讯作者：
S. Tagawa
中科院分区：
文献类型：
--
作者：
S. Tsuji;T. Kozawa;Yukio Yamamoto*;S. Tagawa
为了开发和改进化学放大抗蚀剂，利用脉冲辐解技术研究了酸生成反应的机理和基质效应。离子酸和非离子酸发生器在甲醇溶液中受到电离辐射照射时，起到电子清除剂的作用，从而形成BrNsted酸。测定了酸产生剂与溶剂化电子反应的速率常数。其反应速率常数在(1.6~2.7)×10~(10)M~(-1)·S~(-1)范围内。非离子产生剂也被发现对溶剂化的电子有很高的反应性。无论结构和极性如何，酸生成器通过以接近扩散控制的极限的速率清除溶剂化电子来促进酸的生成。阐明了产酸剂与碱聚合物俘获电子的反应。结果表明，化学放大EB抗蚀剂中产酸剂对电子的清除反应有两个过程，且这两个过程都对产酸机理有贡献。
For development and improvement of chemically amplified resists, the mechanisms of acid-generation reactions and the matrix effects were studied by using a pulse radiolysis technique. Ionic and nonionic acid generators act as electron scavengers when irradiated with an ionizing radiation in methanol solutions, resulting in the formation of Brφnsted acids. Rate constants for the reactions of the acid generators with a solvated electron have been determined. The rate constants of the onium salts were in the range of (1.6-2.7)x1010M-1 s-1. The nonionic acid generators were also found to be highly reactive to the solvated electron. Regardless of the structures and the polarities, the acid generators contribute to the acid generation by scavenging the solvated electron with the rates close to the diffusion-controlled limit. The reaction of acid generator with electrons trapped by base polymer was clarified. It would appear that electron scavenging reaction by acid generator in chemically amplified EB resist have two processes, and both process contribute to acid generation mechanism.