A Versatile Microwave Plasma Applicator
A Versatile Microwave Plasma Applicator
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DOI：
10.1557/proc-124-353
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发表时间：
1988
期刊：
影响因子：
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通讯作者：
T-R. Ji;J. E. Gerling
中科院分区：
文献类型：
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作者：
T-R. Ji;J. E. Gerling
本文介绍了一种用于将微波能量大面积引入等离子体室的装置，该装置具有高的传输效率和良好的能量均匀性。施用器设计基于与石英窗组合的开槽波导。计算了WR430波导宽壁上缝隙的阻抗特性。进行了低功率模拟试验，以确定最佳的几何形状。利用一个简单的测试系统测量并绘制三维空间能量分布图
This paper describes a device used for the introduction of microwave energy into a plasma chamber over a wide area with high transfer efficiency and good energy uniformity. The applicator design was based on a slotted waveguide combined with a quartz window. The impedance properties were calculated for slots in the broad wall of WR430 waveguide. Low power simulating tests were conducted to determine the optimum geometry. A simple test system was used to measure and plot the three-dimensional spatial energy distribution