Preparation of Photosensitive Gel Films and Fine Patterning of Amorphous Al2O3–SiO2 Thin Films
Preparation of Photosensitive Gel Films and Fine Patterning of Amorphous Al2O3–SiO2 Thin Films
复制标题
DOI：
10.1016/s0025-5408(97)00188-8
复制
发表时间：
1998
影响因子：
5.4
通讯作者：
Gaoyang Zhao;N. Tohge
中科院分区：
文献类型：
--
作者：
Gaoyang Zhao;N. Tohge
研究了紫外光照射对由苯甲酰丙酮化学改性的丁醇铝和部分水解的乙醇硅制备的xAl 2 O3·（100−x）SiO2凝胶薄膜性能的影响。这些凝胶膜在β-二酮配体的螯合环中的π-π跃迁的特征在约325 nm处显示出光学吸收带。用365 nm的紫外光照射凝胶膜使螯合环解离，同时降低了凝胶膜在含HNO 3的乙醇中的溶解度。这一发现成功地应用于x = 30或更高的xAl 2 O3·（100-x）SiO2凝胶膜的精细图案化。凝胶膜在通过掩模的UV照射后在含有HNO 3的乙醇中浸出，并在400°C下热处理20分钟以得到图案化的非晶Al 2 O3-SiO2膜。
The effects of UV irradiation on the properties of xAl2O3·(100−x)SiO2gel films, which were obtained from aluminum butoxide chemically modified with benzoylacetone and partly hydrolyzed silicon ethoxide, have been studied. These gel films showed an optical absorption band at around 325 nm characteristic of the π–π∗ transition in chelate rings of β-diketonate ligands. The irradiation of the gel films with UV light of 365 nm dissociated the chelate ring and simultaneously decreased the solubility of the gel films in ethanol containing HNO3. This finding was successfully applied to the fine patterning of xAl2O3·(100−x)SiO2gel films with x = 30 or above. The gel films were leached in ethanol containing HNO3, after UV irradiation through a mask, and heat-treated at 400°C for 20 min to give patterned amorphous Al2O3–SiO2films.