Fabrication of a large area monolayer of silica particles on a sapphire substrate by a spin coating method
Fabrication of a large area monolayer of silica particles on a sapphire substrate by a spin coating method
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DOI：
10.1016/j.colsurfa.2006.10.027
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发表时间：
2007-04-05
影响因子：
5.2
通讯作者：
Okuyama, Kikuo
中科院分区：
文献类型：
--
作者：
Ogi, Takashi;Modesto-Lopez, Luis Balam;Okuyama, Kikuo
将亚微米尺寸的二氧化硅（SiO2）颗粒（550和300 nm）的单层快速沉积在蓝宝石衬底（θ 2 in.）通过旋涂。制备单层膜的时间仅为25秒，与先前报道的用于在单层中组装颗粒的方法相比，这是非常短的时间。溶液中SiO2颗粒的浓度、环境湿度（相对湿度，RH）和旋转速度都是实现大面积单层膜的重要参数。通过适当控制上述制备参数，实现了从基底中心到边缘的60-81%（或平均约72%）的相对高的表面覆盖率和均匀的SiO2颗粒单层膜。我们的结论是，这种方法可以在工业应用中使用，因为该过程的速度和成本。(c)2006 Elsevier B. V.保留所有权利。
Monolayers of submicron size silica (SiO2) particles (550 and 300 nm) were rapidly deposited on sapphire substrate (theta 2 in.) by spin coating. The time to prepare the monolayer film was only 25 s, a very short time compared with previously reported methods used for assembling particles in monolayers. The concentration of SiO2 particles in the solution, the ambient humidity (relative humidity, RH) and the spin speed were all important parameters in achieving a large area monolayer film. A relatively high surface coverage and uniform monolayer film of SiO2 Particles in the range of 60-81% from the center to the edge of the substrate (or the average is around 72%) was achieved by appropriate control of the above preparation parameters. We conclude that this method could be used in industrial applications, because of the speed and cost of the process. (c) 2006 Elsevier B.V. All rights reserved.