Electron optics for dual-beam low energy electron microscopy
Electron optics for dual-beam low energy electron microscopy
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DOI：
10.1016/j.nima.2010.11.130
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发表时间：
2011-07-21
影响因子：
1.4
通讯作者：
Mankos, Marian
中科院分区：
文献类型：
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作者：
Mankos, Marian
双束低能电子显微镜 (LEEM) 是一种新颖的成像技术，可将 LEEM 应用扩展到非导电基底。在双光束 LEEM 中，两个具有相反充电特性的泛光光束照亮视野，以减轻在 LEEM 中对具有绝缘或浮动表面的基板成像时发生的充电效应。由部分吸收的镜面光束产生的负电荷效应由电子产额超过 1 的较高能量电子束或光子束的正电荷效应进行补偿。对现有和新型双束 LEEM 方法的电子光学设计进行了回顾和比较。 (C) 2010 Elsevier B.V. 保留所有权利。
Dual-beam low energy electron microscopy (LEEM) is a novel imaging technique that extends LEEM applications to non-conductive substrates. In dual-beam LEEM, two flood beams with opposite charging characteristics illuminate the field of view in order to mitigate the charging effects occurring when substrates with insulating or floating surfaces are imaged in a LEEM. The negative charging effect, created by a partially absorbed mirror beam, is compensated by the positive charging effect of either a higher energy electron beam with an electron yield exceeding 1, or a photon beam. The electron-optical designs of existing and novel dual-beam LEEM approaches are reviewed and compared. (C) 2010 Elsevier B.V. All rights reserved.