Configuration of a single grown-in dislocation corresponding to one etch pit formed on the surface of CVD homoepitaxial diamond

Configuration of a single grown-in dislocation corresponding to one etch pit formed on the surface of CVD homoepitaxial diamond
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与 CVD 同质外延金刚石表面形成的一个蚀坑相对应的单个生长位错的配置

DOI:
10.1016/j.jcrysgro.2016.09.030
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发表时间:
2016
影响因子:
1.8
通讯作者:
Y. Mokuno
Y. Mokuno
中科院分区:
材料科学3区
文献类型:
--
作者:
N. Tsubouchi;Y. Mokuno

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