Fabrication and ultraviolet photoresponse characteristics of ordered SnOx (x ≈ 0.87, 1.45, 2) nanopore films.
Fabrication and ultraviolet photoresponse characteristics of ordered SnOx (x ≈ 0.87, 1.45, 2) nanopore films.
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DOI：
10.1186/1556-276x-6-615
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发表时间：
2011-12-06
影响因子：
--
通讯作者：
Shen W
中科院分区：
文献类型：
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作者：
Li C;Zheng M;Wang X;Yao L;Ma L;Shen W
以多孔阳极氧化铝为模板，采用直流磁控溅射和氧化退火法成功制备了不同x(x≈0.87，1.45，2)的SnO_x纳米孔薄膜，厚度约为150 nm。由于这种有序纳米孔膜具有较高的比表面积，与用于紫外检测的薄膜相比，其恢复时间有了很大的提高。尤其是x较低的有序SnOx纳米孔膜表现出更高的紫外光灵敏度和更短的电流恢复时间，这是由于这种SnOx薄膜中的氧空位浓度较高所致。本工作为紫外光探测器提供了一种潜在的候选材料。PACs：81.15.Cd，81.40，Ef，81.70.Jb，85.60 Gz。
Based on the porous anodic aluminum oxide templates, ordered SnOx nanopore films (approximately 150 nm thickness) with different x (x ≈ 0.87, 1.45, 2) have been successfully fabricated by direct current magnetron sputtering and oxidizing annealing. Due to the high specific surface area, this ordered nanopore films exhibit a great improvement in recovery time compared to thin films for ultraviolet (UV) detection. Especially, the ordered SnOx nanopore films with lower x reveal higher UV light sensitivity and shorter current recovery time, which was explained by the higher concentration of the oxygen vacancies in this SnOx films. This work presents a potential candidate material for UV light detector. PACS: 81.15.Cd, 81.40.Ef, 81.70.Jb, 85.60.Gz.