Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points
Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points
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DOI：
10.1117/12.781232
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发表时间：
2008-04
期刊：
影响因子：
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通讯作者：
F. Horst;W. Green;B. Offrein;Y. Vlasov
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文献类型：
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作者：
F. Horst;W. Green;B. Offrein;Y. Vlasov
提出了一种用于片上光网络的超小型集成中阶梯光栅波分复用器。这些装置基于具有两个散光点的设计。该器件采用绝缘体上硅（SOI）光波导技术制造，因此最小版本的（解）复用器仅占用250x200 μm的面积。我们将展示中阶梯光栅装置的不同变化的测量结果。在测量中，我们发现通道间隔离度为19 dB。相对于直波导，最小插入损耗仅为3dB，通道间变化为0.5dB。已经进行了各种尝试，并提出和讨论了结果。该方法可用于工程和生物学各个领域的计量和成像应用。
We present ultra-compact integrated optical echelle grating WDM (de-)multiplexers for on-chip optical networks. These devices are based on a design with two stigmatic points. The devices were fabricated using Silicon-On-Insulator (SOI) photonic waveguide technology thus the smallest version of the (de-)multiplexer occupies an area of only 250x200 μm. We will show measurement results on different variations of the echelle grating devices. In the measurements, we found a channel to channel isolation of 19 dB. The minimum insertion loss, relative to a straight waveguide, is only 3 dB with a channel to channel variation of 0.5 dB.nefit of the numerical reconstruction properties of DH in combination with diffraction grating to get super-resolution. Various attempts have been performed and results are presented and discussed. The approaches could be used for metrology and imaging application in various fields of engineering and biology.