Photoinduced Refractive Index Modulation of Photosensitive Polyimides and Their Application in Passive Waveguide Fabrication
Photoinduced Refractive Index Modulation of Photosensitive Polyimides and Their Application in Passive Waveguide Fabrication
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光敏聚酰亚胺的光致折射率调制及其在无源波导制造中的应用
DOI：
10.1080/10587250108024773
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发表时间：
2001
期刊：
影响因子：
--
通讯作者：
Chulhee Kim
中科院分区：
文献类型：
--
作者：
Myong;Jinkyu Kim;Yoonsang Cheong;Jaewook Kang;Jang;Chulhee Kim
摘要以对苯二丙烯酰氯、双（3，4-二羧基苯基）六氟丙烷二酐和4，4 ′-二羟基二苯基二胺为原料，经共聚、酰亚胺化反应，合成了一种新型光敏性聚酰胺-共酰亚胺。所得聚合物在没有添加剂的情况下显示出固有的光敏性、在溶液中良好的加工性和高达350 °C的高热稳定性。通过棱镜耦合法测量聚合物的折射率，发现折射率可以相对于曝光时间精确地变化（对于2 μm厚的膜，TE模式，在1.55 μm处测量，从1.6444到1.6230）。尝试通过光图案化工艺制造无源波导，即，折射率的光调制。该直波导制作简单，用1.55 μm近红外光观察到单模近场图。
Abstract A novel photosensitive poly(amide-co-imide) was synthesized from the copolymerization of p-phenylenediacryloyl chloride, bis(3,4-dicarboxyliphenyl)hexafluoropropane dianhydride and 4,4′-oxydipehnyldiamine followed by subsequent chemical imidization. The resulting polymer showed intrinsic photosensitivity without additives, good processability in solution and high thermal stability up to 350 °C. From the refractive index measurement of the polymer by prism coupling method, it was found that the refractive index could be varied precisely with respect to the exposure time (from 1.6444 to 1.6230 for 2 μm thick film, TE mode, measured at 1.55 μm). Fabrication of passive waveguide was attempted by the photo-patterning process, i.e., photo-modulation of refractive index. Straight waveguide was easily fabricated and single mode near-field pattern was observed by using 1.55 μm near-IR light.