Photoreversibly switchable superhydrophobic surface with erasable and rewritable pattern
Photoreversibly switchable superhydrophobic surface with erasable and rewritable pattern
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DOI：
10.1021/ja0655901
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发表时间：
2006-11-15
影响因子：
15
通讯作者：
Cho, Kilwon
中科院分区：
文献类型：
--
作者：
Lim, Ho Sun;Han, Joong Tark;Cho, Kilwon
我们报道了一种功能性纳米多孔多层膜的简易制造方法，该多层膜具有在紫外/可见光照射下在超疏水性和超亲水性之间可逆可调的润湿性。我们的方法控制表面粗糙度与静电自组装过程中，并利用光响应的氟化偶氮苯分子的分子开关。选择性的紫外线照射到纳米结构的基板上，以实现极端润湿性能的可擦除和可擦除图案的基板。我们的发现将为外部刺激响应智能表面开辟新的途径。
We report the facile fabrication of a functional nanoporous multilayer film with wettability that is reversibly tunable between superhydrophobicity and superhydrophilicity with UV/visible irradiation. Our approach controls surface roughness with an electrostatic self-assembly process and makes use of the photoresponsive molecular switching of fluorinated azobenzene molecules. Selective UV irradiation onto the nanostructured substrate was used to realize substrates with erasable and rewritable patterns of extreme wetting properties. Our findings will open up new avenues for external stimuli-responsive smart surfaces.