Positive ion polymerization in hydrogen diluted silane plasmas
Positive ion polymerization in hydrogen diluted silane plasmas
复制标题
氢稀释硅烷等离子体中的正离子聚合
DOI：
10.1063/1.3042263
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发表时间：
2008
影响因子：
4
通讯作者：
M. Kondo
中科院分区：
文献类型：
--
作者：
S. Nunomura;M. Kondo
在0.1-10托气压下，用氢稀释的硅烷等离子体测量了正离子和中性离子的质谱。离子的质谱随压强而变化，而中性粒子的质谱保持类似的形状。主要离子种类从在10.5托的氢离子组到在10.5 -1托的单硅氢化物离子组和在10.1托的多晶硅氢化物离子组变化，这是由电离通道和连续的离子-分子反应确定的。 离子轰击被抑制的压力，从几十个电子伏在101托到几个电子伏在107托。
Mass spectra of positive ions (cations) and neutrals have been measured in hydrogen diluted silane plasmas at gas pressures of 0.1–10 Torr. The mass spectrum of ions changes with the pressure, while that of neutrals maintains a similar shape. The dominant ion species varies from a hydrogen ion group at ≲0.5 Torr to a monosilicon hydride ion group at ≈0.5–1 Torr and polysilicon hydride ion groups at ≳1 Torr, which is determined from ionization channels and consecutive ion-molecule reactions. The ion bombardment is suppressed with the pressure, from several tens of eV at ≲1 Torr to a few eV at ≳7 Torr.