SPUTTERING BY FAST IONS BASED ON A SUM OF IMPULSES
SPUTTERING BY FAST IONS BASED ON A SUM OF IMPULSES
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DOI：
10.1103/physrevb.40.49
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发表时间：
1989-07-01
影响因子：
3.7
通讯作者：
FENYO, D
中科院分区：
文献类型：
--
作者：
JOHNSON, RE;SUNDQVIST, BUR;FENYO, D
通过对脉冲求和，可以获得快离子固体溅射的简单、统一的描述。对于电子和碰撞能量沉积，每单位路径长度 (dE/dx) 的产率与能量沉积的比例与 (dE/dx) 的三个不同区域的实验一致，每个区域表现出不同的喷射特征：单事件、“扩散尖峰”和“压力脉冲”。后者是一种体积喷射机制，当离子穿透深度较大时，产率在高 (dE/dx) 时缩放为 (dE/dx) 3。该机制可以解释所观察到的从固态喷射的完整生物分子的产率和完整分子离子的喷射角的依赖性。
A simple, unifying description of the sputtering of solids by fast ions is obtained by summing impulses. For both electronic and collisional energy deposition, the scaling of the yield versus energy deposition per unit path length (dE/dx) is in agreement with experiment in three different regions of (dE/dx), each exhibiting different ejection characteristics: single events,‘‘diffusive spike,’’and ‘‘pressure pulse.’’The latter is a volume ejection mechanism for which the yield scales as (dE/dx) 3 at high (dE/dx) when the ion penetration depth is large. This mechanism can account for the observed dependence of the yield of intact biomolecules ejected from the solid state and the ejection angles for the intact molecular ions.