Effect of Negative-Ion-Bombardment Suppression by Applying Voltage to Grids Set Between Substrate and Sputtering Target During Sputtering Deposition on Crystalline Orientation of ZnO Film
Effect of Negative-Ion-Bombardment Suppression by Applying Voltage to Grids Set Between Substrate and Sputtering Target During Sputtering Deposition on Crystalline Orientation of ZnO Film
复制标题
溅射沉积过程中对基片与溅射靶之间设置的栅极施加负离子轰击抑制对ZnO薄膜晶体取向的影响
DOI：
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发表时间：
2020
期刊：
影响因子：
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通讯作者：
T. Yanagitani
中科院分区：
文献类型：
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作者：
K. Tominaga;S. Takayanagi;T. Yanagitani
