Radiation-induced reactions of chemically amplified x-ray and electron-beam resists based on deprotection of t-butoxycarbonyl groups
Radiation-induced reactions of chemically amplified x-ray and electron-beam resists based on deprotection of t-butoxycarbonyl groups
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基于叔丁氧基羰基脱保护的化学放大 X 射线和电子束抗蚀剂的辐射诱导反应
DOI：
10.1116/1.589689
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发表时间：
1997
影响因子：
1.4
通讯作者：
Y. Yamashita
中科院分区：
文献类型：
--
作者：
T. Kozawa;S. Nagahara;Y. Yoshida;S. Tagawa;Takeo Watanabe;Y. Yamashita
用时间分辨(脉冲辐解)和稳态光学吸收光谱研究了基于叔丁氧基去保护的化学放大抗蚀剂中的辐射诱导反应。用电子束和同步辐射照射部分tBOC保护的酚醛树脂时，促进产酸的中间产物(苯氧基自由基和基础树脂的质子加合物)的产率随着羟基保护比的增加而降低。因此，产酸效率与保护率密切相关。讨论了产酸机理与保护率的关系。
Radiation-induced reactions in chemically amplified resists based on deprotection of t-butoxycarbonyl groups have been investigated by both time-resolved (the pulse radiolysis methods) and steady-state optical absorption spectroscopy. Upon exposure of a partially tBOC-protected novolak by electron and synchrotron radiation beams, the yields of the intermediates contributing to the acid generation (phenoxyl radical and proton adducts of base resin) decreased with increasing the protection ratio of hydroxyl groups. Therefore, the efficiency of the acid generation is closely related with the protection ratio. The relation of the acid generation mechanism with the protection ratio was discussed.