Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect
Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect
复制标题
基于压印自清洁效应的纳米压印印章高效清洁方法
DOI：
10.1088/0957-4484/22/18/185301
复制
发表时间：
2011
期刊：
影响因子：
3.5
通讯作者：
H. Xu
中科院分区：
文献类型：
--
作者：
F. Meng;G. Luo;I. Maximov;L. Montelius;Ye Zhou;L. Nilsson;P. Carlberg;B. Heidari;J. Chu;H. Xu
纳米压印光刻(NIL)是一种非传统的光刻技术，它承诺以低成本、高通量的方式制作分辨率低于10 nm的结构图案。纳米压印邮票的污染是零技术产业化的关键障碍之一。在这里，我们报告了两种有效的方法来去除邮票上典型的颗粒污染和残留的抗蚀剂：热压印和紫外线(UV)压印清洗-这两种方法都是基于压印过程的自清洁效果。被污染的邮票被压印在聚合物基材上，在去掉后，用有机溶剂进行处理。清洗前后的邮票图像表明，这两种清洗方法可以在不破坏邮票结构的情况下有效地去除邮票上的污染物。清洗前后印章的接触角表明，清洗方法不会显著降低防粘层。本工作中报告的清洁工艺也可用于衬底清洁。
Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning—both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning.