A VLSI artwork legalization technique based on a new criterion of minimum layout perturbation
A VLSI artwork legalization technique based on a new criterion of minimum layout perturbation
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基于最小布局扰动新标准的VLSI图稿合法化技术
DOI:
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发表时间:
1997
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通讯作者:
G. Téllez
中科院分区:
文献类型:
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作者:
Fook;Zhan Chen;G. Téllez
In this paper we propose a novel VLSI artwork modification technique based on the concept of a minimum layoutperturbation. Layouts are designed so that minimum design rules must be satisfied. Often layout processes such as custom layout methodologies and design rule migration activities introduce design rule violations in layouts. A minimum layout perturbation defines a minimum cost change to a layout, such that the resulting layout satisfies all design rules. We formulate the minimum perturbation cost with the objective of preserving as much as possible the geometric and topological features of the original layout. The proposed minimum perturbation problem formulation is transformed into a linear programming problem with special structure. We exploit the structure of the problem to propose efficient algorithms that solve the problem. We also propose and implement a practical graph-based simplex algorithm, which we compare to a commercially available linear programming package, resulting in more than 40X performance improvements in some cases. Finally, the proposed methods have been implemented and used in real life problems, for example in the technology migration of data path macros and a 30O-cell gate array library.