Directed self-assembly cut mask assignment for unidirectional design
Directed self-assembly cut mask assignment for unidirectional design
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DOI：
10.1117/1.jmm.14.3.031211
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发表时间：
2015-07
期刊：
影响因子：
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通讯作者：
Jiaojiao Ou;Bei Yu;Jhih-Rong Gao;D. Pan
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文献类型：
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作者：
Jiaojiao Ou;Bei Yu;Jhih-Rong Gao;D. Pan
抽象。最近，定向自组装（DSA）已成为一个有前途的光刻解决方案，削减制造。我们对DSA感知掩模优化问题进行了全面的研究，以提供切割层上的DSA友好设计。我们首先制定的问题作为一个整数线性规划（ILP）分配削减到不同的指导模板，目标冲突最小化和线端扩展最小化。由于ILP可能无法扩展非常大的规模的问题，我们提出了两个加速策略。第一种方法是将初始问题分解为多个小问题并分别求解，然后在不损失质量的情况下进行解的合并。第二种方法是利用集合覆盖算法确定DSA引导模式的分配，从而使模板的放置合法化。我们的方法可以很自然地扩展到处理任意DSA引导模板模式与复杂的形状。实验结果表明，我们的方法可以显着提高DSA友好性，即，可以减少未解析的图案数目和线端扩展。
Abstract. Recently, directed self-assembly (DSA) has emerged as a promising lithography solution for cut manufacturing. We perform a comprehensive study on the DSA aware mask optimization problem to provide a DSA friendly design on cut layers. We first formulate the problem as an integer linear programming (ILP) to assign cuts to different guiding templates, targeting both conflict minimization and line-end extension minimization. As ILP may not be scalable for very large size problems, we then propose two speed-up strategies. The first one is to decompose the initial problem into smaller ones and solve them separately, followed by solution merging without much loss of quality. The second one is using the set cover algorithm to decide the DSA guiding pattern assignment, and then legalize the template placement. Our approaches can be naturally extended to handle arbitrary DSA guiding template patterns with complicated shapes. Experimental results show that our methodologies can significantly improve the DSA friendly, i.e., both the unresolved pattern number and the line-end extensions can be reduced.