Antireflective Coatings: Conventional Stacking Layers and Ultrathin Plasmonic Metasurfaces, A Mini-Review.
Antireflective Coatings: Conventional Stacking Layers and Ultrathin Plasmonic Metasurfaces, A Mini-Review.
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DOI：
10.3390/ma9060497
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发表时间：
2016-06-21
期刊：
影响因子：
--
通讯作者：
Elbahri M
中科院分区：
文献类型：
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作者：
Keshavarz Hedayati M;Elbahri M
减少物质表面不需要的光反射对于提高光学和光子器件的性能非常重要。由单层或堆叠电介质层、纳米/微米结构或两者的混合物制成的抗反射涂层（ARC）是抑制反射的传统设计几何形状。理论纳米光子学和纳米制造的最新进展使得微型涂层的设计和制造变得更加灵活，这反过来又大大推进了 ARC 领域的发展。特别是，等离子体和超表面的出现使得能够实现比工作波长薄一个数量级的宽带和角度不敏感的 ARC 涂层。在这篇综述中，简要概述了 ARC 的发展，特别关注最先进的基于等离子体和超表面的抗反射表面。
Reduction of unwanted light reflection from a surface of a substance is very essential for improvement of the performance of optical and photonic devices. Antireflective coatings (ARCs) made of single or stacking layers of dielectrics, nano/microstructures or a mixture of both are the conventional design geometry for suppression of reflection. Recent progress in theoretical nanophotonics and nanofabrication has enabled more flexibility in design and fabrication of miniaturized coatings which has in turn advanced the field of ARCs considerably. In particular, the emergence of plasmonic and metasurfaces allows for the realization of broadband and angular-insensitive ARC coatings at an order of magnitude thinner than the operational wavelengths. In this review, a short overview of the development of ARCs, with particular attention paid to the state-of-the-art plasmonic- and metasurface-based antireflective surfaces, is presented.