Spin current generation from sputtered Y3Fe5O12 films
Spin current generation from sputtered Y3Fe5O12 films
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DOI：
10.1063/1.4898161
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发表时间：
2014-10-21
影响因子：
3.2
通讯作者：
Saitoh, E.
中科院分区：
文献类型：
--
作者：
Lustikova, J.;Shiomi, Y.;Saitoh, E.
用自旋泵浦和自旋Seebeck效应研究了溅射YIG膜向邻近的铂层注入的自旋电流。采用同轴磁控射频溅射技术在室温下制备了厚度分别为83纳米和96纳米的薄膜，并对其进行了后处理。根据铁磁共振线宽随频率变化的关系，估算出其衰减常数为(7.0+/-1.0)×10(-4)。由自旋泵浦和自旋Seebeck效应产生的自旋电流的大小与液相外延制备的YIG薄膜的自旋电流大小相同。有效的自旋电流注入可以归因于良好的YIG垂直棒铂界面，其大的自旋混合电导(2.0+/-0.2)×1018m(-2)证实了这一点。(C)2014 AIP出版有限责任公司。
Spin current injection from sputtered yttrium iron garnet (YIG) films into an adjacent platinum layer has been investigated by means of the spin pumping and the spin Seebeck effects. Films with a thickness of 83 and 96 nanometers were fabricated by on-axis magnetron rf sputtering at room temperature and subsequent post-annealing. From the frequency dependence of the ferromagnetic resonance linewidth, the damping constant has been estimated to be (7.0+/-1.0) x 10(-4). Magnitudes of the spin current generated by the spin pumping and the spin Seebeck effect are of the same order as values for YIG films prepared by liquid phase epitaxy. The efficient spin current injection can be ascribed to a good YIG vertical bar Pt interface, which is confirmed by the large spin-mixing conductance (2.0+/-0.2) x 10 18 m(-2). (C) 2014 AIP Publishing LLC.