Structural and magnetic effects of Ni addition in FeN films
Structural and magnetic effects of Ni addition in FeN films
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DOI：
10.1063/1.1559637
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发表时间：
2003-03
影响因子：
3.2
通讯作者：
L. Zhuge;W. Yao;X. Wu
中科院分区：
文献类型：
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作者：
L. Zhuge;W. Yao;X. Wu
采用双离子束溅射技术在玻璃衬底上制备了Fe-Ni-N薄膜。研究了添加镍对Fe-N薄膜结构、磁性能和热稳定性的影响。在γ′-(Fe,Ni)4N相中，Ni的加入影响薄膜的生长、氮含量和择优取向。随着Ni含量的增加，Fe-Ni-N薄膜中γ′相的（200）平面主要平行于衬底平面，表明可以控制晶体取向。当Ni含量为21.2 at时，形成了一种晶粒均向（200）方向取向的γ′-(Fe,Ni)4N相膜。%。含镍薄膜的矫顽力HC低于无镍薄膜。膜的Ni含量为6.7 at。%表现出良好的软磁性能，HC=0.68 kA/m， MS=2.04 t，但由于Ni的存在，Fe-N薄膜的热稳定性减弱。
Fe–Ni–N films were prepared on glass substrates by dual ion beam sputtering. The effect of nickel (Ni) addition on the structure, magnetic properties, and thermal stability of Fe–N films was investigated. In the γ′-(Fe,Ni)4N phase, the addition of Ni influences the growth, nitrogen content, and the preferred orientation of the film. The (200) plane of the γ′-phase in the Fe–Ni–N films grows dominantly parallel to the substrate plane with increasing Ni content, indicating the possibility of controlling the crystal orientation. A single γ′-(Fe,Ni)4N phase film with all grains oriented in the (200) direction was actually grown for a Ni content of 21.2 at. %. The coercivity HC of Ni-containing films was lower than that of the Ni-free films. The film with Ni content of 6.7 at. % showed good soft magnetic properties, with HC=0.68 kA/m and MS=2.04 T. The thermal stability, however, was weakened due to the existence of Ni in the Fe–N films.