Highly ordered anodic porous alumina with 13-nm hole intervals using a 2D array of monodisperse nanoparticles as a template
Highly ordered anodic porous alumina with 13-nm hole intervals using a 2D array of monodisperse nanoparticles as a template
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DOI：
10.1002/smll.200500440
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发表时间：
2006-04-01
期刊：
影响因子：
13.3
通讯作者：
Masuda, H
中科院分区：
文献类型：
--
作者：
Matsui, Y;Nishio, K;Masuda, H
由于其在各种功能纳米器件中的潜在应用，人们对制备具有纳米尺度有序孔的纳米孔阵列结构越来越感兴趣。[1-3]阳极多孔氧化铝是一种典型的自有序孔阵列材料，由铝在酸性溶液中阳极氧化形成，由于其由均匀尺寸组成的独特几何结构，是纳米器件起始结构的候选材料。 垂直于表面的直孔。据报道，在适当的条件下对Al进行阳极氧化可生成长程有序的阳极多孔氧化铝。[4, 5]此外，通过使用模具压印对Al进行预纹理与随后的阳极氧化相结合，可以制备理想有序的阳极多孔氧化铝。[6-8]在此过程中，压印Al形成的浅凹面可以在阳极氧化过程中引发孔的形成，并产生理想有序的阳极多孔氧化铝。 整个样品区域的孔阵列结构。减小阳极多孔氧化铝中的孔尺寸和孔间隔，同时保持孔阵列的有序性对于扩展该材料的应用至关重要。然而，孔径小于10nm的高度有序阳极多孔氧化铝的制备迄今尚未成功。在低压阳极氧化条件下，自然发生的孔排列顺序消失，从而产生间隔更小的孔阵列。至于使用Al预纹理的工艺，由于难以制备极精细图案的模具，迄今为止孔间距的减小仅限于45nm。 [8]在本报告中，我们展示了使用二维 (2D) 纳米粒子阵列作为模板，制造孔间距为 13 nm、孔尺寸小于 10 nm 的高度有序阳极多孔氧化铝。本研究中获得的孔尺寸和间隔是迄今为止报道的具有高度有序孔结构的阳极多孔氧化铝的最小孔尺寸和间隔。
There has been growing interest in the preparation of nanohole array structures that have ordered holes on the nanometer scale due to their potential application in various functional nanodevices.[1–3] Anodic porous alumina, which is a typical self-ordered hole-array material formed by the anodization of Al in acidic solution, is a candidate for the starting structure of a nanodevice due to its unique geometrical structures composed of uniform-sized straight holes perpendicular to the surface. It has been reported that the anodization of Al under appropriate conditions generates long-range-ordered anodic porous alumina.[4, 5] In addition, the combination of pretexturing of Al by imprinting using a mold and subsequent anodization enables the fabrication of ideally ordered anodic porous alumina.[6–8] In this process, shallow concaves formed by imprinting Al can initiate hole development during anodization and yield an ideally ordered hole array structure over the entire area of samples. Reductions in hole size and hole interval in anodic porous alumina while maintaining the ordering of the hole array are essential for extending the application of the material. However, the preparation of highly ordered anodic porous alumina with holes less than 10nm in diameter has not been successful thus far. The naturally occurring ordering of the hole arrangement disappears under low-voltage anodization conditions, which generates a hole array with smaller intervals. As for the process using the pretexturing of Al, the reduction in hole interval has until now been limited to 45nm due to the difficulty in the preparation of a mold with an extremely fine pattern.[8] In the present report, we demonstrate the fabrication of highly ordered anodic porous alumina with a hole interval of 13 nm and a hole size of less than 10 nm using a two-dimensional (2D) array of nanoparticles as a template. The hole size and interval obtained in the present study are the smallest thus far reported for anodic porous alumina with a highly ordered hole configuration.