Theoretical investigation of subwavelength structure fabrication based on multi-exposure surface plasmon interference lithography
Theoretical investigation of subwavelength structure fabrication based on multi-exposure surface plasmon interference lithography
复制标题
基于多次曝光表面等离子体干涉光刻的亚波长结构制造理论研究
DOI：
10.1016/j.rinp.2018.12.029
复制
发表时间：
2019-03-01
影响因子：
5.3
通讯作者：
Qi, Yunping
中科院分区：
文献类型：
--
作者：
Wang, Xiangxian;Pang, Zhiyuan;Qi, Yunping
提出了一种基于多曝光表面等离子体干涉光刻的亚波长结构制备方法。这种新型的纳米光刻技术不同于常规的利用双激光干涉和样品旋转来书写各种微观结构的方法，它可以制造出打破衍射极限的各种亚波长结构。利用表面等离激元干涉光刻理论，结合坐标矩阵变换，对所提纳米光刻技术获得的光场分布进行了分析。通过模拟不同样品旋转对应的光场分布，展示了各种特殊的亚波长结构，包括二维晶格结构和周期准六边形结构。这些结构在微光学和纳米光学应用中具有潜在的用途。
We propose a method of fabricating subwavelength structures based on multi-exposure surface plasmon interference lithography. This new nanolithography technique fabricates various subwavelength structures breaking the diffraction limit, which differs from the common method of writing various micro structures by using a twolaser-beam interference with sample rotation. Analysis of the optical field distributions obtained using the proposed nanolithography technique, which was performed using the theory of surface plasmon interference lithography in combination with coordinate matrix transformation, is also provided. Various special subwavelength structures are demonstrated by presenting simulated optical field distributions corresponding to different sample rotations, including two-dimensional lattice structures and periodic quasi-hexagonal structures. These structures are potentially useful in micro- and nano-optics applications.