Mechanism of Neel Order Switching in Antiferromagnetic Thin Films Revealed by Magnetotransport and Direct Imaging

Mechanism of Neel Order Switching in Antiferromagnetic Thin Films Revealed by Magnetotransport and Direct Imaging
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DOI:
10.1103/physrevlett.123.177201
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发表时间:
2019-10-24
影响因子:
8.6
通讯作者:
Klaeui, M.
Klaeui, M.
中科院分区:
物理与天体物理1区
文献类型:
--
作者:
Baldrati, L.;Gomonay, O.;Klaeui, M.

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