Sputtering of low- Z materials
Sputtering of low- Z materials
复制标题
低Z材料的溅射
DOI：
10.1016/0022-3115(91)90010-5
复制
发表时间：
1991
影响因子：
3.1
通讯作者：
J. László
中科院分区：
文献类型：
--
作者：
J. Roth;W. Eckstein;E. Gauthier;J. László
由于等离子体中相对较高的可耐受浓度，等离子体表面材料通常由低z材料制成。由于纯石墨在高温下表现出增强的侵蚀机制，其他低锌材料，如Be， B及其化合物和碳化物，以及掺杂各种元素的石墨也被研究。在未来的聚变反应堆中，选择等离子体表面材料的关键当然是它对热冲击和中子辐照的稳定性。然而，在本研究中，材料的比较只考虑离子轰击下溅射的侵蚀。首先，考虑对入射角的依赖，对低锌元素与D+和selons的物理溅射进行了比较。其次，给出了BeO、Be2C、Be4B、B4C和TiC等低锌化合物的溅射数据。讨论了由优先溅射和表面偏析引起的这些化合物的理论处理困难。最后，将低锌材料在高温下的行为与纯石墨和掺硼石墨进行了比较。
Plasma facing materials are generally made from low-Zmaterials due to their relatively high tolerable concentration in the plasma. As pure graphite shows regimes of enhanced erosion at elevated temperatures, other low-Zmaterials, such as Be, B and their compounds and carbides are examined, as well as graphite doped with various elements.For the choice of a plasma facing material in future fusion reactors crucial points are certainly its stability against thermal shocks and neutron irradiation. However, in this study materials are compared only in view of their erosion due to sputtering under ion bombardment. Firstly, low-Zelements are compared with regard to physical sputtering with D+and selfions, taking the dependence on the angle of incidence into account. Secondly, sputtering data for low-Zcompounds, such as BeO, Be2C, Be4B, B4C and TiC are presented. Difficulties in the theoretical treatment of these compounds arising from preferential sputtering and surface segregation are discussed. Finally, the behaviour of low-Zmaterials at elevated temperatures is compared to pure and boron-doped graphite.