Homogeneous crystalline FeSi2 films of c(4 x 8) phase grown on Si(111) by reactive deposition epitaxy
Homogeneous crystalline FeSi2 films of c(4 x 8) phase grown on Si(111) by reactive deposition epitaxy
复制标题
反应沉积外延法在 Si(111) 上生长 c(4 x 8) 相均质晶体 FeSi2 薄膜
作者：
Li-Min Sun;Gao-Min Shi;Xiao-Yong Liu;Xu Li
