Modified double-double bend achromat lattice for an ultra-low emittance design of the HLS

Modified double-double bend achromat lattice for an ultra-low emittance design of the HLS
复制标题

改进的双双弯消色差晶格,用于 HLS 的超低发射率设计

DOI:
10.1088/1748-0221/17/07/p07001
复制
发表时间:
2022-07
影响因子:
1.3
通讯作者:
Z. Bai
Z. Bai
中科院分区:
工程技术4区
文献类型:
--
作者:
Z. Ren;B. Wei;H. Xu;G. Liu;Z. Bai

文献摘要

参考文献

相似文献

合肥光源储存环由四个双弯消色差晶格单元组成,每个单元有两个直段。本文提出了一种改进的双双弯曲消色差(DDBA)结构,用于合肥光源的超低发射度设计,其中储存环的周长和所有直线段的长度保持不变。与典型的DDBA晶格相比,这种改进的晶格可以在中间直段获得更低的发射度和更低的色散,从而提供更高的插入器件辐射亮度。用改进的DDBA晶格设计的合肥光源的自然发射度为3.9nm·rad,比现有的合肥光源的自然发射度低一个数量级。
The storage ring of the present Hefei Light Source (HLS) consists of four double-bend achromat lattice cells, each with two straight sections. In this paper, a modified double-double bend achromat (DDBA) lattice is proposed for an ultra-low emittance design of HLS, where the circumference of the storage ring and the lengths of all straight sections remain the same. Compared to the typical DDBA lattice, this modified lattice can obtain both lower emittance and lower dispersion in the mid-straight section, thus providing higher brightness of insertion device radiation. The natural emittance of the HLS designed with the modified DDBA lattice is 3.9 nm·rad, about one order of magnitude lower than that of the present HLS.
影响因子: 1.4
作者:
R. Nagaoka;A. Wrulich
通讯作者: R. Nagaoka;A. Wrulich
DOI: 10.18429/jacow-ipac2021-mopab112
发表时间: 2021-08
期刊: --
影响因子: --
作者:
Z. Bai;G. Feng;Tianlong He;Weimin Li;Weiwei Li;Gangwen Liu;Z. Ren;Lin Wang;Penghui Yang;Shancai Zhang;Tong Zhang
通讯作者: Z. Bai;G. Feng;Tianlong He;Weimin Li;Weiwei Li;Gangwen Liu;Z. Ren;Lin Wang;Penghui Yang;Shancai Zhang;Tong Zhang
DOI: 10.1103/physrevaccelbeams.22.021601
发表时间: 2018-10
影响因子: 1.7
作者:
Bernard Riemann;A. Streun
通讯作者: Bernard Riemann;A. Streun
影响因子: 1.4
作者:
Lingyun Yang;D. Robin;F. Sannibale;C. Steier;W. Wan
通讯作者: Lingyun Yang;D. Robin;F. Sannibale;C. Steier;W. Wan
DOI: 10.1103/physrevstab.14.054001
发表时间: 2011-05
影响因子: --
作者:
Lingyun Yang;Y. Li;W. Guo;S. Krinsky
通讯作者: Lingyun Yang;Y. Li;W. Guo;S. Krinsky